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1

Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface

Pan, Guoshun, Zhou, Yan, Luo, Guihai, Shi, Xiaolei, Zou, Chunli, Gong, Hua

Journal:

Journal of Materials Science: Materials in Electronics

Year:

2013

Language:

english

File:

PDF, 1.04 MB

english, 2013

2

Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism

Shi, Xiao-Lei, Chen, Gaopan, Xu, Li, Kang, Chengxi, Luo, Guihai, Luo, Haimei, Zhou, Yan, Dargusch, Matthew S., Pan, Guoshun

Journal:

Applied Surface Science

Year:

2020

Language:

english

File:

PDF, 3.47 MB

english, 2020

3

Study on the improved fuzzy clustering algorithm and its application in brain image segmentation

Ren, Tianbao, Wang, Huanhuan, Feng, Huilin, Xu, Chensheng, Liu, Guoshun, Ding, Pan

Journal:

Applied Soft Computing

Year:

2019

Language:

english

File:

PDF, 1.09 MB

english, 2019

4

Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Gong, Hua, Luo, Guihai, Gu, Zhonghua

Journal:

Surface and Coatings Technology

Year:

2014

Language:

english

File:

PDF, 1.71 MB

english, 2014

5

An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mode in both liquid and air environments

Shi, Xiaolei, Xu, Li, Zhou, Yan, Zou, Chunli, Wang, Rongrong, Pan, Guoshun

Journal:

Year:

2018

Language:

english

File:

PDF, 5.60 MB

english, 2018

6

Chemical Mechanical Polishing (CMP) of Fused Silica (FS) Using Ceria Slurry Recycling

Zhou, Yan, Luo, Haimei, Luo, Guihai, Chen, Gaopan, Kang, Chengxi, Pan, Guoshun

Journal:

ECS Journal of Solid State Science and Technology

Year:

2020

File:

PDF, 1.58 MB

2020

7

Particles detection and analysis of hard disk substrate after cleaning of post chemical mechanical polishing

Yating Huang, Xinchun Lu, Guoshun Pan, Bill Lee, Jianbin Luo

Journal:

Applied Surface Science

Year:

2009

Language:

english

File:

PDF, 369 KB

english, 2009

8

AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP)

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Gong, Hua, Xu, Li, Zou, Chunli

Journal:

Journal of Materials Science: Materials in Electronics

Year:

2015

Language:

english

File:

PDF, 1.41 MB

english, 2015

9

Fabrication of Cu2ZnSnS4absorber layers with adjustable Zn/Sn and Cu/Zn+Sn ratios

Pan, Bin, Wei, Ming, Liu, Weifeng, Jiang, Guoshun, Zhu, Changfei

Journal:

Journal of Materials Science: Materials in Electronics

Year:

2014

Language:

english

File:

PDF, 1.42 MB

english, 2014

10

Characteristics of Slurry Recycling in Chemical Mechanical Polishing (CMP) of Fused Silica (FS)

Zhou, Yan, Luo, Haimei, Luo, Guihai, Kang, Chengxi, Chen, Gaopan, Pan, Guoshun

Journal:

ECS Journal of Solid State Science and Technology

Year:

2019

File:

PDF, 953 KB

2019

11

Structural and mechanical properties of nano-crystal TiN coatings

Chenhui Zhang, Guoshun Pan, Jianbin Luo, Wenzhi Li, Darong Chen

Journal:

SCIENCE CHINA Physics, Mechanics & Astronomy

Year:

2004

Language:

english

File:

PDF, 748 KB

english, 2004

12

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

Shi, Xiaolei, Pan, Guoshun, Zhou, Yan, Xu, Li, Zou, Chunli, Gong, Hua

Journal:

Surface and Coatings Technology

Year:

2015

Language:

english

File:

PDF, 6.05 MB

english, 2015

13

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - CMP of GaN using sulfate radicals generated by metal catalyst

Chunli, Zou, Guoshun, Pan, Li, Xu, Xiaolei, Shi, Liu, Yuyu

Year:

2014

Language:

english

File:

PDF, 550 KB

english, 2014

14

Surface modulation to enhance chemical mechanical polishing performance of sliced silicon carbide Si-face

Chen, Gaopan, Li, Jianguo, Long, Jiangyou, Luo, Haimei, Zhou, Yan, Xie, Xiaozhu, Pan, Guoshun

Journal:

Applied Surface Science

Year:

2021

File:

PDF, 7.49 MB

2021

15

The Cycle Characteristics of Slurries in Chemical Mechanical Polishing (CMP) of Fused Silica

Kang, Chengxi, Gao, Bin, Guo, Dan, Luo, Haimei, Pan, Guoshun

Journal:

ChemistrySelect

Year:

2020

File:

PDF, 4.60 MB

2020

16

Mechanical model of nanoparticles for material removal in chemical mechanical polishing process

Hao Chen,Dan Guo,Guoxin Xie,Guoshun Pan

Journal:

Year:

2016

Language:

english

File:

PDF, 1.77 MB

english, 2016

17

Application of surface analysis in study on removal mechanism and abrasive selection during fused silica chemical mechanical polishing

Chen, Gaopan, Luo, Haimei, Kang, Chengxi, Luo, Guihai, Zhou, Yan, Pan, Guoshun

Journal:

Surface and Interface Analysis

Year:

2019

Language:

english

File:

PDF, 1.74 MB

english, 2019

18

Characterization of sapphire chemical mechanical polishing performances using silica with different sizes and their removal mechanisms

Zhou, Yan, Pan, Guoshun, Gong, Hua, Shi, Xiaolei

Journal:

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Year:

2016

Language:

english

File:

PDF, 1.44 MB

english, 2016

19

Study on Pad Performance Deterioration in Chemical Mechanical Polishing (CMP) of Fused Silica

Zhou, Yan, Luo, Haimei, Pan, Guoshun, Zou, Chunli, Luo, Guihai, Chen, Gaopan, Kang, Chengxi

Journal:

ECS Journal of Solid State Science and Technology

Year:

2018

Language:

english

File:

PDF, 733 KB

english, 2018

20

Progress in material removal mechanisms of surface polishing with ultra precision

Jin Xu, Jianbin Luo, Xinchun Lu, Chaohui Zhang, Guoshun Pan

Journal:

Chinese Science Bulletin

Year:

2004

Language:

english

File:

PDF, 986 KB

english, 2004

21

Molecular markers of biomass burning, fungal spores and biogenic SOA in the Taklimakan desert aerosols

Fu, Pingqing, Zhuang, Guoshun, Sun, Yele, Wang, Qiongzhen, Chen, Jing, Ren, Lujie, Yang, Fan, Wang, Zifa, Pan, Xiaole, Li, Xiangdong, Kawamura, Kimitaka

Journal:

Atmospheric Environment

Year:

2015

Language:

english

File:

PDF, 2.63 MB

english, 2015

22

Inhibitors for organic phosphonic acid system abrasive free polishing of Cu

Zhang Wei, Lu Xinchun, Liu Yuhong, Pan Guoshun, Luo Jianbin

Journal:

Applied Surface Science

Year:

2009

Language:

english

File:

PDF, 242 KB

english, 2009

23

Study on the cyclotriphosphazene film on magnetic head surface

Luo Jianbin, Yang Mingchu, Zhang Chaohui, Pan Guoshun, Wen Shizhu

Journal:

Tribology International

Year:

2004

Language:

english

File:

PDF, 497 KB

english, 2004

24

A modified decal method for preparing the membrane electrode assembly of proton exchange membrane fuel cells

Liang, Xiaolu, Pan, Guoshun, Xu, Li, Wang, Jiashu

Journal:

Year:

2015

Language:

english

File:

PDF, 1.84 MB

english, 2015

25

A comparative study between graphene oxide and diamond nanoparticles as water-based lubricating additives

YuHong Liu, XiaoKang Wang, GuoShun Pan, JianBin Luo

Journal:

Science China Technological Sciences

Year:

2013

Language:

english

File:

PDF, 687 KB

english, 2013

26

A non-noble material cathode catalyst dual-doped with sulfur and nitrogen as efficient electrocatalysts for oxygen reduction reaction

Xu, Li, Pan, Guoshun, Shi, Xiaolei, Zou, Chunli, Zhou, Yan, Luo, Guihai, Chen, Gaopan

Journal:

Electrochimica Acta

Year:

2015

Language:

english

File:

PDF, 354 KB

english, 2015

27

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - The effects of ultra-smooth surface atomic step morphology on CMP performances of sapphire and SiC wafers

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Zou, Chunli, Gong, Hua, Xu, Li, Luo, Guihai, Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Zou, Chunli, Gong, Hua, Xu, Li, Luo, Guihai

Year:

2014

Language:

english

File:

PDF, 748 KB

english, 2014

28

Probing Particle Movement in CMP with Fluorescence Technique

Lei, Jun, Guo, Dan, Luo, Jianbin, Pan, Guoshun

Journal:

Journal of The Electrochemical Society

Year:

2011

Language:

english

File:

PDF, 2.27 MB

english, 2011

29

Synergistic roles of mixed inhibitors and the application of mixed complexing ligands in copper chemical mechanical polishing

Ning Wang, Guoshun Pan, Yan Liu

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 500 KB

english, 2011

30

Introduction of Burn-up Credit in Nuclear Criticality Safety Analysis

Guoshun You, Chunming Zhang, Xinyi Pan

Journal:

Procedia Engineering

Year:

2012

Language:

english

File:

PDF, 253 KB

english, 2012

31

Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

Gong, Hua, Pan, Guoshun, Zhou, Yan, Shi, Xiaolei, Zou, Chunli, Zhang, Suman

Journal:

Applied Surface Science

Year:

2015

Language:

english

File:

PDF, 2.15 MB

english, 2015

32

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - Atomically smooth gallium nitride surfaces generated by chemical mechanical polishing with non-noble metal catalyst(Fe-Nx/C) in acid solution

Xu, Li, Pan, Guoshun, Zou, Chunli, Shi, Xiaolei, Liu, Yuyu

Year:

2014

Language:

english

File:

PDF, 178 KB

english, 2014

33

Antitumor effector B cells directly kill tumor cells via the Fas/FasL pathway and are regulated by IL-10

Tao, Huimin, Lu, Lin, Xia, Yang, Dai, Fu, Wang, Yi, Bao, Yangyi, Lundy, Steven K., Ito, Fumito, Pan, Qin, Zhang, Xiaolian, Zheng, Fang, Shu, Guoshun, Fang, Bingmu, Jiang, Jinhong, Xia, Jianchuang, Hua

Journal:

European Journal of Immunology

Year:

2015

Language:

english

File:

PDF, 1.02 MB

english, 2015

34

An empirical approach to explain the material removal rate for copper chemical mechanical polishing

Pan Guoshun, Wang Ning, Gong Hua, Liu Yan

Journal:

Tribology International

Year:

2012

Language:

english

File:

PDF, 365 KB

english, 2012

35

Contact ratio of rough surfaces with multiple asperities in mixed lubrication at high pressures

Huaping Xiao, Dan Guo, Shuhai Liu, Guoshun Pan, Xinchun Lu

Journal:

Applied Surface Science

Year:

2012

Language:

english

File:

PDF, 1.93 MB

english, 2012

36

The Assessment of Interface Adhesion of Cu/Ta/Black Diamond™/Si Films Stack Structure by Nanoindentation and Nanoscratch Tests

Liao, Chenglong, Guo, Dan, Wen, Shizhu, Lu, Xinchun, Pan, Guoshun, Luo, Jianbin

Journal:

Tribology Letters

Year:

2014

Language:

english

File:

PDF, 1012 KB

english, 2014

37

Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Zhang, Suman, Gong, Hua, Luo, Guihai

Journal:

Tribology International

Year:

2015

Language:

english

File:

PDF, 3.27 MB

english, 2015

38

Effect of photocatalytic oxidation technology on GaN CMP

Wang, Jie, Wang, Tongqing, Pan, Guoshun, Lu, Xinchun

Journal:

Applied Surface Science

Year:

2016

Language:

english

File:

PDF, 3.19 MB

english, 2016

39

Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization

Shi, Xiaolei, Pan, Guoshun, Zhou, Yan, Zou, Chunli, Gong, Hua

Journal:

Applied Surface Science

Year:

2013

Language:

english

File:

PDF, 6.39 MB

english, 2013

40

Influence of colloidal silica dispersion on the decrease of roughness in silicon chemical mechanical polishing

Chen, Gaopan, Luo, Haimen, Liu, Yuhong, Pan, Guoshun, Luo, Guihai

Journal:

Micro & Nano Letters

Year:

2016

Language:

english

File:

PDF, 300 KB

english, 2016

41

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

GuoShun Pan, ZhongHua Gu, Yan Zhou, Tuo Li, Hua Gong, Yan Liu

Journal:

Year:

2011

Language:

english

File:

PDF, 593 KB

english, 2011

42

Chemical Mechanical Polishing (CMP) of SiC Wafer Using Photo-Catalyst Incorporated Pad

Zhou, Yan, Pan, Guoshun, Zou, Chunli, Wang, Lei

Journal:

ECS Journal of Solid State Science and Technology

Year:

2017

Language:

english

File:

PDF, 1.04 MB

english, 2017

43

Preparation of a novel catalyst (SoFe III ) and its catalytic performance towards the removal rate of sapphire substrate during CMP process

Xu, Li, Zhang, Xin, Kang, Chengxi, Wang, Rongrong, Zou, Chunli, Zhou, Yan, Pan, Guoshun

Journal:

Tribology International

Year:

2018

Language:

english

File:

PDF, 1.45 MB

english, 2018

44

Effect of pH on Material Removal Rate of Cu in Abrasive-Free Polishing

Wei, Zhang, Xinchun, Lu, Yuhong, Liu, Guoshun, Pan, Jianbin, Luo

Journal:

Journal of The Electrochemical Society

Year:

2009

Language:

english

File:

PDF, 614 KB

english, 2009

45

Polishing behavior of PS/SiO 2 Core-Shell nanoparticles with different shell thickness on fused silica Chemical Mechanical Polishing

Zhang, Xin, Pan, Guoshun, Wang, Weiqi, Guo, Dan

Journal:

IOP Conference Series Materials Science and Engineering

Year:

2019

Language:

english

File:

PDF, 805 KB

english, 2019

46

Film Thickness of Ionic Liquids Under High Contact Pressures as a Function of Alkyl Chain Length

Huaping Xiao, Dan Guo, Shuhai Liu, Guoshun Pan, Xinchun Lu

Journal:

Tribology Letters

Year:

2011

Language:

english

File:

PDF, 631 KB

english, 2011

47

Selenization of mixed metal oxides for dense and ZnSe-free Cu2ZnSnSe4 absorber films

Deng, Yitao, Chen, Guilin, Pan, Bin, Li, JianMin, Jiang, Guoshun, Liu, Weifeng, Zhu, Changfei

Journal:

Journal of Alloys and Compounds

Year:

2014

Language:

english

File:

PDF, 892 KB

english, 2014

48

Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S2O82- - Fe2+ based slurry

Shi, Xiaolei, Zou, Chunli, Pan, Guoshun, Gong, Hua, Xu, Li, Zhou, Yan

Journal:

Tribology International

Year:

2016

Language:

english

File:

PDF, 2.75 MB

english, 2016

49

Compression for smoothing and densifying CuInSe2 and Cu2ZnSnSe4 thin films coating from oxides nanoparticles precursor

Chen, Guilin, Pan, Bin, Jin, Lu, Jiang, Guoshun, Liu, Weifeng, Zhu, Changfei

Journal:

Journal of Alloys and Compounds

Year:

2014

Language:

english

File:

PDF, 669 KB

english, 2014

50

Effect of Modified Silica Abrasive Particles on Nanosized Particle Deposition in Final Polishing of Silicon Wafers

Gong, Hua, Pan, Guoshun, Gu, Zhonghua, Zou, Chunli, Liu, Yan

Journal:

Tribology Transactions

Year:

2014

Language:

english

File:

PDF, 656 KB

english, 2014

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